International Bid Contractor
| Bid Title | Country |
|---|---|
| Summary | |
| Bid Date | |
| Brand Name or equal for complete system DL 100/Pro Design tunable diode laser. | ![]() USA |
| ...diode,875-940 nanometer wavelength range, 40 ...which an EQUAL product must meet are: | |
| Posted Date: May 20, 2012 Bid Date: Jun 20, 2012 | |
| High Resolution Nanoparticle Sizer | ![]() USA |
| ...to noise ratios. 2.5 nanometer detection Single particle ...shall also include product literature which addresses | |
| Posted Date: May 18, 2012 Bid Date: May 25, 2012 | |
| Recovery- Anue Delay Emulator | ![]() USA |
| ...Hawaii 2 blade Emulator) products or equivalent to ...along with 850-nanometer and 1310-...providing an equivalent product must respond, in | |
| Posted Date: May 01, 2012 Bid Date: May 10, 2012 | |
| Field Emission Gun (FEG) Scanning Electron Microscope (SEM) | ![]() USA |
| ...sub-micron, and nanometer scale, taking advantage ...demonstrates that offered products and services meet ...determine whether the product offered meets the | |
| Posted Date: Apr 24, 2012 Bid Date: May 09, 2012 | |
| CRYOGEN-FREE MICROSCOPY CRYOSTAT SYSTEM | ![]() USA |
| ...micrometers and sub-nanometer resolution in all ...relevant to your product or capabilities. Also, | |
| Posted Date: Mar 07, 2012 Bid Date: Mar 21, 2012 | |
| Mentor Graphics Design Environment | ![]() USA |
| ...design verification in nanometer technologies. b. Estimated Cost: $...other generally available product literature published by | |
| Posted Date: Mar 07, 2012 | |
| Computer-Controlled Schottky Field-Emission Scanning Electron Microscope System | ![]() USA |
| ...image and measure nanometer-sized features. The ...examination of either product literature or technical | |
| Posted Date: Feb 07, 2012 Bid Date: Mar 05, 2012 | |
| Computer-Controlled Schottky Field-Emission Scanning Electron Microscope System | ![]() USA |
| ...image and measure nanometer-sized features. The ...examination of either product literature or technical | |
| Posted Date: Feb 03, 2012 Bid Date: Mar 05, 2012 | |
| Ultraviolet Imager System | ![]() USA |
| ...from 200-450 nanometers, a minimum detector sized ...Government Personnel Work Product; DFARS 252.204- | |
| Posted Date: Dec 06, 2011 Bid Date: Dec 12, 2011 | |
| Deep Silicon Etcher - Contracting POC: Ashley Wilson | ![]() USA |
| ...Ratio Sidewall Roughness (nanometers) Etch Rate (Microns ...whether the proposed product meets the performance | |
| Posted Date: Nov 24, 2011 Bid Date: Dec 23, 2011 | |
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